ASTM-E2245 2002

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E2245-02 Standard Test Method for Residual Strain Measurements of Thin, Reflecting Films Using an Optical Interferometer

Published By	Publication Date	Number of Pages
ASTM	2002	16

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Categories: 37.040.20 - Photographic paper, films and plates. Cartridges, ASTM

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Description

1.1 This test method covers a procedure for measuring the compressive residual strain in thin films. It applies only to films, such as found in microelectromechanical systems (MEMS) materials, which can be imaged using an interferometer. Measurements from fixed-fixed beams that are touching the underlying layer are not accepted.

1.2 This test method uses a non-contact optical interferometer with the capability of obtaining topographical 3-D data sets. It is performed in the laboratory.

1.3 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.

Additional information

Standard Title	E2245-02 Standard Test Method for Residual Strain Measurements of Thin, Reflecting Films Using an Optical Interferometer
Published Code	ASTM
Publication Date	2002
Pages Count	16
ICS Codes	37.040.20 - Photographic paper, films and plates. Cartridges

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ASTM-E2245 2002

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