ISO 22415:2019

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Surface chemical analysis — Secondary ion mass spectrometry — Method for determining yield volume in argon cluster sputter depth profiling of organic materials

Published By	Publication Date	Number of Pages
ISO	2019-05	38

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Categories: 71.040.40 - Chemical analysis, ISO

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Description

This document specifies a method for measuring and reporting argon cluster sputtering yield volumes of a specific organic material. The method requires one or more test samples of the specified material as a thin, uniform film of known thickness between 50 and 1 000 nanometres on a flat substrate which has a different chemical composition to the specified material. This document is applicable to test samples in which the specified material layer has homogeneous composition in depth and is not applicable if the depth distribution of compounds in the specified material is inhomogeneous. This document is applicable to instruments in which the sputtering ion beam irradiates the sample using a raster to ensure a constant ion dose over the analysis area.

Additional information

Published Code	ISO
Published By	International Organization for Standardization
Publication Date	2019-05
Pages Count	38
Language	English
Edition	1
File Size	3.6 MB
ICS Codes	71.040.40 - Chemical analysis

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ISO 22415:2019

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